A furnace stack for advanced photovoltaic, photonic and microfabrication applications

Advanced silicon photovoltaic, photonic, optoelectronic and micro-electromechanical devices require state of the art processing equipment for the deposition of thin dielectric films and for controlled doping of the devices. Key techniques include the deposition of stoichiometric and silicon rich silicon nitride and silicon dioxide films, and the controlled wafer doping with boron and phosphorus. A state of the art furnace stack is to be procured which will satisfy these requirements on industrially relevant wafer sizes up to 150mm. The equipment will support a broad range of research projects in the above fields, ranging from fundamental investigations to applied research carried out in collaboration with industry partners.