A novel approach to direct nanopatterning of silicon for advanced phase-changed devices

  • Williams, Jim (PI)
  • Bradby, Jodie (CoI)
  • Ruffell, Simon (CoI)

    Project: Research

    Project Details

    Description

    This project brings together a research team at the ANU with extensive experience in nanoindentation, Si processing and electrical measurements with two industry partners: a leading nanoindentation instrumentation company and a new Australian high-tech company. We take a totally innovative approach to patterning silicon at the nanoscale using the introduction of topographical features and electrically conducting zones of silicon by nanoindentation. The project will allow a simple low temperature route to fabrication of a range of novel silicon devices without conventional lithographic patterning. The project will provide world-class training for young scientists and help maintain Australia s cutting-edge research profile in nanotechnology.
    StatusFinished
    Effective start/end date31/12/0913/03/13

    Funding

    • Australian Research Council (ARC): A$380,000.00
    • Hysitron Inc: A$78,000.00

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