A novel approach to direct nanopatterning of silicon for advanced phase-changed devices

This project brings together a research team at the ANU with extensive experience in nanoindentation, Si processing and electrical measurements with two industry partners: a leading nanoindentation instrumentation company and a new Australian high-tech company. We take a totally innovative approach to patterning silicon at the nanoscale using the introduction of topographical features and electrically conducting zones of silicon by nanoindentation. The project will allow a simple low temperature route to fabrication of a range of novel silicon devices without conventional lithographic patterning. The project will provide world-class training for young scientists and help maintain Australia s cutting-edge research profile in nanotechnology.