A novel maskless process for patterning and doping of silicon

This project will study a totally new means of patterning and electrically modifying silicon in a single step using nanoindentation at room temperature. The process relies on nanoindentation to produce phase-changed regions in silicon with either electrically insulating or conducting properties. We plan to study the physics underlying the phase change process as well as technological applications. This research has the potential to develop patentable technologies of interest to Australian and world-wide industries. The project will provide world-class training for young scientists, essential for the development of high-tech industries in Australia, and for maintaining Australia s cutting-edge research profile.