Combined reactor for the plasma-enhanced chemical vapour deposition (PECVD) of amorphous layers of silicon,silicon nitride and silicon oxide, and for Reactive Ion Etching

Our small, but very productive group (up to 30 publications per Discovery grant) has reached critical mass (8 people), and the acquisition of essential infrastructure is peremptory. Without the proposed plasma reactor our strong international impact (10 papers, one invited, at the 2003 world conference on photovoltaics) will wane. This machine permits to deposit thin layers of silicon nitride and amorphous silicon and is a versatile tool for investigating silicon materials for photovoltaics and microelectronics. Such reactors have become an essential tool for silicon solar cell work. Most laboratories across the world have at least one, including UNSW, but access to the latter is impractical.