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Combined Reactor for the Plasma-Enhanced Chemical Vapour Deposition (PECVD) of Amorphous Layers of Silicon, Silicon Nitride and Silicon Oxide and for Reactive Ion Etching
Cuevas, Andres
(PI)
Project
:
Research
Overview
Project Details
Status
Finished
Effective start/end date
30/04/05
→
31/12/05
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