LE200100174 - X-Ray Nanolithography Facility: Towards the ultimate resolution

This Project aims to address the need for precise and scalable nanoscale fabrication by establishing a synchrotron-based X-Ray Nanolithography Facility. This Project expects to generate new knowledge in the areas of advanced manufacturing and nanotechnology using an innovative approach that combines coherent lithography and coherent imaging metrology. Expected outcomes of this project include an internationally unique, nationally accessible capability for manufacturing at the nanoscale and for industry-driven collaborative research. This should provide significant benefits across fields that aim to harness the unique properties of engineered nanomaterials to greatly enhance the technologies required to solve global challenges.