LE200100174 - X-Ray Nanolithography Facility: Towards the ultimate resolution

This Project aims to address the need for precise and scalable nanoscale fabrication by establishing asynchrotron-based X-Ray Nanolithography Facility. This Project expects to generate new knowledge in the areasof advanced manufacturing and nanotechnology using an innovative approach that combines coherent lithographyand coherent imaging metrology. Expected outcomes of this project include an internationally unique, nationallyaccessible capability for manufacturing at the nanoscale and for industry-driven collaborative research. Thisshould provide significant benefits across fields that aim to harness the unique properties of engineerednanomaterials to greatly enhance the technologies required to solve global challenges.