Ultrafast Laser Ablation and Deposition of Thin Films

We have developed an innovative approach to Pulsed Laser Deposition of thin films by using low energy, short picosecond laser pulses at very high, MHz-range repetition rates. Out approach radically improves the quality of the deposited films by eliminating the problem of contamination of the deposited film by particulates as well as significantly increasing the deposition rate. The proposed research will extend the technology to use femtosecond-range laser pulses. The aim will be to determine the conditions in which such short pulses can create smooth and homogeneous amorphous or crystalline films with very high quality and precise stoichiometry.