A novel silicon texturization method based on etching through a silicon nitride mask

Engineering

• Nitride 100%
• Texturization 100%
• Thin Layer 50%
• Silicon Solar Cell 50%
• Chemical Vapor Deposition 50%
• Vapor Deposition 50%
• Texturing 50%
• Passivation 50%
• Quasi Steady State 50%

Material Science

• Silicon 100%
• Silicon Nitride 100%
• Oxide Compound 50%
• Silicon Solar Cell 50%
• Reflectivity 50%
• Low Pressure Chemical Vapor Deposition 50%
• Surface Texture 50%