A protective layer on As2S3 film for photo-resist patterning

Duk Yong Choi; Steve Madden; Andrei Rode; Rongping Wang; Douglas Bulla; Barry Luther-Davies

doi:10.1016/j.jnoncrysol.2008.05.067

A protective layer on As₂S₃ film for photo-resist patterning

Duk Yong Choi^*
, Steve Madden
, Andrei Rode
, Rongping Wang
, Douglas Bulla
, Barry Luther-Davies

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

We have developed an effective fabrication process for As₂S₃ planar waveguides. A bottom anti-reflection coating provides a layer that not only protects the As₂S₃ film from attack by the alkaline developer but also improves line edge roughness of photo-resist patterns which is a pre-requisite for waveguides with smooth sidewalls. Crown

Original language	English
Pages (from-to)	5253-5254
Number of pages	2
Journal	Journal of Non-Crystalline Solids
Volume	354
Issue number	47-51
DOIs	https://doi.org/10.1016/j.jnoncrysol.2008.05.067
Publication status	Published - 1 Dec 2008

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10.1016/j.jnoncrysol.2008.05.067

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title = "A protective layer on As2S3 film for photo-resist patterning",

abstract = "We have developed an effective fabrication process for As2S3 planar waveguides. A bottom anti-reflection coating provides a layer that not only protects the As2S3 film from attack by the alkaline developer but also improves line edge roughness of photo-resist patterns which is a pre-requisite for waveguides with smooth sidewalls. Crown",

keywords = "Chalcogenides, Chemical durability, Planar waveguides, Processing, Vapor phase deposition",

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T1 - A protective layer on As2S3 film for photo-resist patterning

AU - Choi, Duk Yong

AU - Madden, Steve

AU - Rode, Andrei

AU - Wang, Rongping

AU - Bulla, Douglas

AU - Luther-Davies, Barry

PY - 2008/12/1

Y1 - 2008/12/1

N2 - We have developed an effective fabrication process for As2S3 planar waveguides. A bottom anti-reflection coating provides a layer that not only protects the As2S3 film from attack by the alkaline developer but also improves line edge roughness of photo-resist patterns which is a pre-requisite for waveguides with smooth sidewalls. Crown

AB - We have developed an effective fabrication process for As2S3 planar waveguides. A bottom anti-reflection coating provides a layer that not only protects the As2S3 film from attack by the alkaline developer but also improves line edge roughness of photo-resist patterns which is a pre-requisite for waveguides with smooth sidewalls. Crown

KW - Chalcogenides

KW - Chemical durability

KW - Planar waveguides

KW - Processing

KW - Vapor phase deposition

UR - https://www.scopus.com/pages/publications/55549085833

U2 - 10.1016/j.jnoncrysol.2008.05.067

DO - 10.1016/j.jnoncrysol.2008.05.067

M3 - Article

SN - 0022-3093

VL - 354

SP - 5253

EP - 5254

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

IS - 47-51

ER -

A protective layer on As₂S₃ film for photo-resist patterning

Abstract

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