A versatile WIBS 200 kV ion implanter for materials modification

P. Bond; D. Duckworth; R. G. Elliman; R. Henshaw; S. T. Johnson; M. C. Ridgway; R. P. Thornton; J. S. Williams; P. Byers; D. J. Chivers

doi:10.1016/0168-583X(91)96222-7

A versatile WIBS 200 kV ion implanter for materials modification

P. Bond^*, D. Duckworth, R. G. Elliman, R. Henshaw, S. T. Johnson, M. C. Ridgway, R. P. Thornton, J. S. Williams, P. Byers, D. J. Chivers

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

The Whickham Ion Beam Systems 200 kV ion implanters at the Royal Melbourne Institute of Technology and at Harwell are used for a wide range of materials modification applications covering semiconductor devices, metals, polymers, insulators and industrial components. In particular, this paper describes flexible features of the prototype RMIT machine, concentrating on the scanning and endstation arrangements. Selected applications are reviewed, with particular attention given to variable temperature implantations into semiconductors.

Original language	English
Pages (from-to)	511-516
Number of pages	6
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	55
Issue number	1-4
DOIs	https://doi.org/10.1016/0168-583X(91)96222-7
Publication status	Published - 2 Apr 1991
Externally published	Yes

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Bond, P., Duckworth, D., Elliman, R. G., Henshaw, R., Johnson, S. T., Ridgway, M. C., Thornton, R. P., Williams, J. S., Byers, P., & Chivers, D. J. (1991). A versatile WIBS 200 kV ion implanter for materials modification. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 55(1-4), 511-516. https://doi.org/10.1016/0168-583X(91)96222-7

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abstract = "The Whickham Ion Beam Systems 200 kV ion implanters at the Royal Melbourne Institute of Technology and at Harwell are used for a wide range of materials modification applications covering semiconductor devices, metals, polymers, insulators and industrial components. In particular, this paper describes flexible features of the prototype RMIT machine, concentrating on the scanning and endstation arrangements. Selected applications are reviewed, with particular attention given to variable temperature implantations into semiconductors.",

author = "P. Bond and D. Duckworth and Elliman, {R. G.} and R. Henshaw and Johnson, {S. T.} and Ridgway, {M. C.} and Thornton, {R. P.} and Williams, {J. S.} and P. Byers and Chivers, {D. J.}",

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doi = "10.1016/0168-583X(91)96222-7",

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Bond, P, Duckworth, D, Elliman, RG, Henshaw, R, Johnson, ST, Ridgway, MC, Thornton, RP, Williams, JS, Byers, P & Chivers, DJ 1991, 'A versatile WIBS 200 kV ion implanter for materials modification', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 55, no. 1-4, pp. 511-516. https://doi.org/10.1016/0168-583X(91)96222-7

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AU - Bond, P.

AU - Duckworth, D.

AU - Elliman, R. G.

AU - Henshaw, R.

AU - Johnson, S. T.

AU - Ridgway, M. C.

AU - Thornton, R. P.

AU - Williams, J. S.

AU - Byers, P.

AU - Chivers, D. J.

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AB - The Whickham Ion Beam Systems 200 kV ion implanters at the Royal Melbourne Institute of Technology and at Harwell are used for a wide range of materials modification applications covering semiconductor devices, metals, polymers, insulators and industrial components. In particular, this paper describes flexible features of the prototype RMIT machine, concentrating on the scanning and endstation arrangements. Selected applications are reviewed, with particular attention given to variable temperature implantations into semiconductors.

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JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

IS - 1-4

ER -

A versatile WIBS 200 kV ion implanter for materials modification

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