Above-Band Gap Photoinduced Stabilization of Engineered Ferroelectric Domains

Haoxin Mai, Teng Lu, Qian Li*, Zhifu Liu, Yongxiang Li, Felipe Kremer, Li Li, Ray L. Withers, Haidan Wen, Yun Liu

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    29 Citations (Scopus)

    Abstract

    The effect of above-band gap photons on the domains of the BiFeO3 (BFO) thin film was investigated via piezoresponse force microscopy and Kelvin probe force microscopy. It is found that under above-band gap illumination, the relaxation time of the polarization state was significantly extended, while the effective polarizing voltage for the pristine domains was reduced. We propose that this photoinduced domain stabilization can be attributed to the interaction between photogenerated surface charges and domains. Importantly, a similar phenomenon is observed in other ferroelectric (FE) materials with an internal electric field once they are illuminated by above-band gap light, indicating that this photoinduced stabilization is potentially universal rather than specific to BFO. Thus, this study will not only contribute to the knowledge of photovoltaic (PV) phenomena but also provide a new route to promote the stability of PV and FE materials.

    Original languageEnglish
    Pages (from-to)12781-12789
    Number of pages9
    JournalACS applied materials & interfaces
    Volume10
    Issue number15
    DOIs
    Publication statusPublished - 18 Apr 2018

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