Admittance spectroscopy of Si Si1-x Gex Si quantum well systems: Experiment and theory

Xi Li*, W. Xu, Feng Ying Yuan, Fang Lu

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    4 Citations (Scopus)

    Abstract

    We present a combined experimental and theoretical study on the admittance spectroscopy of Si Si1-x Gex Si single quantum well structures. Experimentally, the admittance spectra are measured for Si1-x Gex -based two-dimensional hole gas systems. The dependence of the spectra on width of the quantum well and on content of Ge is investigated. Theoretically, in conjunction with the measurements we develop a simple and systematic approach to calculate the conductance and capacitance on the basis of a Boltzmann equation in which the emission rate induced by hole-phonon scattering is considered. We compare the theoretical results with those obtained experimentally and find that our model calculation can reproduce nicely the experimental findings.

    Original languageEnglish
    Article number125341
    JournalPhysical Review B - Condensed Matter and Materials Physics
    Volume73
    Issue number12
    DOIs
    Publication statusPublished - 2006

    Fingerprint

    Dive into the research topics of 'Admittance spectroscopy of Si Si1-x Gex Si quantum well systems: Experiment and theory'. Together they form a unique fingerprint.

    Cite this