Aggregation Behavior of Ligand-Protected Au9 Clusters on Sputtered Atomic Layer Deposition TiO2

Hassan S. Al Qahtani; Gregory F. Metha; Rick B. Walsh; Vladimir B. Golovko; Gunther G. Andersson; Tomonobu Nakayama

doi:10.1021/acs.jpcc.6b11590

Aggregation Behavior of Ligand-Protected Au₉ Clusters on Sputtered Atomic Layer Deposition TiO₂

Hassan S. Al Qahtani, Gregory F. Metha, Rick B. Walsh, Vladimir B. Golovko, Gunther G. Andersson^*, Tomonobu Nakayama

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Abstract

[Au₉(PPh₃)₈)](NO₃)₃ (Au₉) clusters were deposited onto sputtered ALD titania surfaces. Atomic force microscopy (AFM) was used to determine the height and distributions of the Au₉ clusters over the titania surface fabricated using atomic layer deposition (ALD). Synchrotron X-ray photoelectron spectroscopy (XPS) was used to derive information about the degree of agglomeration of the Au₉ clusters due to the annealing process. Both AFM and XPS show that the Au₉ clusters deposited on ALD titania are partially agglomerated after annealing. Deposition of the [Au₉(PPh₃)₈)](NO₃)₃ clusters on sputtered ALD titania is compared with deposition of the same cluster on titania nanosheets of previous work.

Original language	English
Pages (from-to)	10781-10789
Number of pages	9
Journal	Journal of Physical Chemistry C
Volume	121
Issue number	20
DOIs	https://doi.org/10.1021/acs.jpcc.6b11590
Publication status	Published - 25 May 2017

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title = "Aggregation Behavior of Ligand-Protected Au9 Clusters on Sputtered Atomic Layer Deposition TiO2",

abstract = "[Au9(PPh3)8)](NO3)3 (Au9) clusters were deposited onto sputtered ALD titania surfaces. Atomic force microscopy (AFM) was used to determine the height and distributions of the Au9 clusters over the titania surface fabricated using atomic layer deposition (ALD). Synchrotron X-ray photoelectron spectroscopy (XPS) was used to derive information about the degree of agglomeration of the Au9 clusters due to the annealing process. Both AFM and XPS show that the Au9 clusters deposited on ALD titania are partially agglomerated after annealing. Deposition of the [Au9(PPh3)8)](NO3)3 clusters on sputtered ALD titania is compared with deposition of the same cluster on titania nanosheets of previous work.",

author = "{Al Qahtani}, {Hassan S.} and Metha, {Gregory F.} and Walsh, {Rick B.} and Golovko, {Vladimir B.} and Andersson, {Gunther G.} and Tomonobu Nakayama",

note = "Publisher Copyright: {\textcopyright} 2017 American Chemical Society.",

year = "2017",

month = may,

day = "25",

doi = "10.1021/acs.jpcc.6b11590",

language = "English",

volume = "121",

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journal = "Journal of Physical Chemistry C",

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TY - JOUR

T1 - Aggregation Behavior of Ligand-Protected Au9 Clusters on Sputtered Atomic Layer Deposition TiO2

AU - Al Qahtani, Hassan S.

AU - Metha, Gregory F.

AU - Walsh, Rick B.

AU - Golovko, Vladimir B.

AU - Andersson, Gunther G.

AU - Nakayama, Tomonobu

PY - 2017/5/25

Y1 - 2017/5/25

N2 - [Au9(PPh3)8)](NO3)3 (Au9) clusters were deposited onto sputtered ALD titania surfaces. Atomic force microscopy (AFM) was used to determine the height and distributions of the Au9 clusters over the titania surface fabricated using atomic layer deposition (ALD). Synchrotron X-ray photoelectron spectroscopy (XPS) was used to derive information about the degree of agglomeration of the Au9 clusters due to the annealing process. Both AFM and XPS show that the Au9 clusters deposited on ALD titania are partially agglomerated after annealing. Deposition of the [Au9(PPh3)8)](NO3)3 clusters on sputtered ALD titania is compared with deposition of the same cluster on titania nanosheets of previous work.

AB - [Au9(PPh3)8)](NO3)3 (Au9) clusters were deposited onto sputtered ALD titania surfaces. Atomic force microscopy (AFM) was used to determine the height and distributions of the Au9 clusters over the titania surface fabricated using atomic layer deposition (ALD). Synchrotron X-ray photoelectron spectroscopy (XPS) was used to derive information about the degree of agglomeration of the Au9 clusters due to the annealing process. Both AFM and XPS show that the Au9 clusters deposited on ALD titania are partially agglomerated after annealing. Deposition of the [Au9(PPh3)8)](NO3)3 clusters on sputtered ALD titania is compared with deposition of the same cluster on titania nanosheets of previous work.

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U2 - 10.1021/acs.jpcc.6b11590

DO - 10.1021/acs.jpcc.6b11590

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JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

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ER -

Aggregation Behavior of Ligand-Protected Au₉ Clusters on Sputtered Atomic Layer Deposition TiO₂

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