Abstract
We prepared a series of (In 2 O 3 ) x (Ga 2 O 3 ) y (ZnO) 1-x-y (0.7 ≤ x ≤ 0.8, 0.05 ≤ y ≤ 0.15) (IGZO) thin films using the pulsed laser deposition (PLD) method at room temperature under same oxygen pressure. The structural, optical and electrical properties of the grown films were measured by various diagnosis tools. X-ray diffraction (XRD) patterns show that the mixing phase of crystalline and amorphous appears in the film with low In 2 O 3 contents, and a completely amorphous phase appears in (In 2 O 3 ) x (Ga 2 O 3 ) y (ZnO) 1-x-y (0.75 ≤ x) thin films with high In 2 O 3 content. The maximum carrier mobility was found to be 30 cm 2 V -1 s -1 in thin film with the (In 2 O 3 ) x = 0.8 content. The transmitted spectrum shows that thin films with the (In 2 O 3 ) x = 0.8 content exhibit better light transmission and narrow band gap. These amorphous IGZO thin films with high mobility and transparency are highly desirable for device fabrication on flexible substrates.
Original language | English |
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Pages (from-to) | 700-703 |
Number of pages | 4 |
Journal | Applied Surface Science |
Volume | 282 |
DOIs | |
Publication status | Published - 1 Oct 2013 |