Anomalous diffusion mediated by atom deposition into a porous substrate

Pascal Brault; Christophe Josserand; Jean Marc Bauchire; Amaël Caillard; Christine Charles; Rod W. Boswell

doi:10.1103/PhysRevLett.102.045901

Anomalous diffusion mediated by atom deposition into a porous substrate

Pascal Brault^*, Christophe Josserand, Jean Marc Bauchire, Amaël Caillard, Christine Charles, Rod W. Boswell

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

51 Citations (Scopus)

Abstract

Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.

Original language	English
Article number	045901
Journal	Physical Review Letters
Volume	102
Issue number	4
DOIs	https://doi.org/10.1103/PhysRevLett.102.045901
Publication status	Published - 26 Jan 2009

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title = "Anomalous diffusion mediated by atom deposition into a porous substrate",

abstract = "Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.",

author = "Pascal Brault and Christophe Josserand and Bauchire, \{Jean Marc\} and Ama{\"e}l Caillard and Christine Charles and Boswell, \{Rod W.\}",

year = "2009",

month = jan,

day = "26",

doi = "10.1103/PhysRevLett.102.045901",

language = "English",

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journal = "Physical Review Letters",

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T1 - Anomalous diffusion mediated by atom deposition into a porous substrate

AU - Brault, Pascal

AU - Josserand, Christophe

AU - Bauchire, Jean Marc

AU - Caillard, Amaël

AU - Charles, Christine

AU - Boswell, Rod W.

PY - 2009/1/26

Y1 - 2009/1/26

N2 - Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.

AB - Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.

UR - https://www.scopus.com/pages/publications/60449116850

U2 - 10.1103/PhysRevLett.102.045901

DO - 10.1103/PhysRevLett.102.045901

M3 - Article

SN - 0031-9007

VL - 102

JO - Physical Review Letters

JF - Physical Review Letters

IS - 4

M1 - 045901

ER -

Anomalous diffusion mediated by atom deposition into a porous substrate

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