@inproceedings{412cd712f06f4ee4992b1c096b1887f6,
title = "Atomic layer deposition of inverse opals for solar cell applications",
abstract = "Atomic layer deposition (ALD) technique shows superior application in the fabrication of TiO2 inverse opals (IO), compared with conventional infiltration methods. In the present report, TiO2 IO structures were infiltrated by ALD method in a continuous-flow and internally developed stop-flow process, respectively. The corresponding optical and optoelectrical properties of TiO2 IO structures were investigated. The prepared uniform IO structure of 288 nm was used as a photoanode for dye-sensitized solar cells. An efficiency of 2.22\% was achieved, which was much higher than that of prepared by conventional solution-infiltration method. It is indicated that ALD method is an effective approach for fabricating TiO2 IO photoanode.",
keywords = "Atomic layer deposition, Solar cell, TiO inverse opal",
author = "Karuturi, \{Siva Krishna\} and Liu, \{Li Jun\} and Su, \{Liap Tat\} and Niu, \{Wen Bin\} and Tok, \{Alfred Ling Yoong\}",
year = "2013",
doi = "10.4028/www.scientific.net/AMR.789.3",
language = "English",
isbn = "9783037857571",
series = "Advanced Materials Research",
pages = "3--7",
booktitle = "Advances in Materials, Processing and Manufacturing",
note = "13th International Conference on Quality in Research, QiR 2013 ; Conference date: 25-06-2013 Through 28-06-2013",
}