Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation

John Canning; Mattias Åslund; Adrian Ankiewicz; Matteo Dainese; Harendra Fernando; Jayanta K. Sahu; Lech Anki Wosinskiewicz

doi:10.1364/AO.39.004296

Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation

John Canning, Mattias Åslund, Adrian Ankiewicz, Matteo Dainese, Harendra Fernando, Jayanta K. Sahu, Lech Anki Wosinskiewicz

Research output: Contribution to journal › Article › peer-review

26 Citations (Scopus)

Abstract

Complete birefringence compensation is demonstrated in plasma-enhanced chemical vapor deposition waveguides by 193-nm postexposure. A single relaxation process dominates the decay in stress anisotropy, indicating that compressive stress from the substrate leads to an elastic stress anisotropy at the core.

Original language	English
Pages (from-to)	4296-4299
Number of pages	4
Journal	Applied Optics
Volume	39
Issue number	24
DOIs	https://doi.org/10.1364/AO.39.004296
Publication status	Published - 20 Aug 2000

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title = "Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation",

abstract = "Complete birefringence compensation is demonstrated in plasma-enhanced chemical vapor deposition waveguides by 193-nm postexposure. A single relaxation process dominates the decay in stress anisotropy, indicating that compressive stress from the substrate leads to an elastic stress anisotropy at the core.",

author = "John Canning and Mattias {\AA}slund and Adrian Ankiewicz and Matteo Dainese and Harendra Fernando and Sahu, {Jayanta K.} and {Anki Wosinskiewicz}, Lech",

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doi = "10.1364/AO.39.004296",

language = "English",

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AU - Canning, John

AU - Åslund, Mattias

AU - Ankiewicz, Adrian

AU - Dainese, Matteo

AU - Fernando, Harendra

AU - Sahu, Jayanta K.

AU - Anki Wosinskiewicz, Lech

PY - 2000/8/20

Y1 - 2000/8/20

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AB - Complete birefringence compensation is demonstrated in plasma-enhanced chemical vapor deposition waveguides by 193-nm postexposure. A single relaxation process dominates the decay in stress anisotropy, indicating that compressive stress from the substrate leads to an elastic stress anisotropy at the core.

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U2 - 10.1364/AO.39.004296

DO - 10.1364/AO.39.004296

M3 - Article

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VL - 39

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JO - Applied Optics

JF - Applied Optics

IS - 24

ER -

Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation

Abstract

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