Abstract
InGaN/GaN light-emitting diode structures with Al-coated GaN nanorods were fabricated by using soft ultraviolet nanoimprint lithography. The intensity of light emission was found to be greatly enhanced due to the strong near-fields confined at the interface of Al/GaN and extended to the multiple quantum wells (MQWs) active region. The dynamics of carrier recombination and plasmon-enhanced Raman scattering were also investigated, providing a progressive view on the effective energy transfer between MQWs and surface plasmons.
Original language | English |
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Article number | 125201 |
Journal | Nanotechnology |
Volume | 26 |
Issue number | 12 |
DOIs | |
Publication status | Published - 27 Mar 2015 |