Carrier dynamics in ion-implanted semiconductors studied by simulation and observation of terahertz emission

J. Lloyd-Hughes*, E. Castro-Camus, M. D. Fraser, H. H. Tan, C. Jagadish, M. B. Johnston

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)

Abstract

We have experimentally measured the terahertz radiation from a series of ion-implanted semiconductors, both from the bare semiconductor surface and from photoconductive switches fabricated on them. GaAs was implanted with As + ions, and InGaAs and InP with Fe+ ions, and all samples were annealed post implantation. An increase in emission power is observed at high frequencies, which we attribute to the ultrafast trapping of carriers. We use a three-dimensional carrier dynamics simulation to model the emission process. The simulation accurately predicts the experimentally observed bandwidth increase, without resorting to any fitting parameters. Additionally, we discuss intervalley scattering, the influence of space-charge fields, and the relative performance of InP, GaAs and In As based photoconductive emitters.

Original languageEnglish
Title of host publicationUltrafast Phenomena in Semiconductors and Nanostructure Materials X
DOIs
Publication statusPublished - 2006
EventUltrafast Phenomena in Semiconductors and Nanostructure Materials X - San Jose, CA, United States
Duration: 23 Jan 200625 Jan 2006

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6118
ISSN (Print)0277-786X

Conference

ConferenceUltrafast Phenomena in Semiconductors and Nanostructure Materials X
Country/TerritoryUnited States
CitySan Jose, CA
Period23/01/0625/01/06

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