| Original language | English |
|---|---|
| Pages (from-to) | 548-551 |
| Journal | Japanese Journal of Applied Physics |
| Volume | 38 |
| Issue number | 38-1 |
| Publication status | Published - 1999 |
Characterisation of ion-implantation-induced disorder in GaAs by EXAFS
Christopher Glover, Kin Man Yu, Mark C Ridgway, Garry J Foran
Research output: Contribution to journal › Article › peer-review