Characterisation of nitrogen-related defects in compound semiconductors by near-edge x-ray absorption fine structure

Mladen Petravic*, Zlatko Majlinger, Ana Bozanic, Yaw Wen Yang, Michael Gao, CCrotti

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    2 Citations (Scopus)

    Abstract

    We have studied the formation of nitrogen-related defects created in compound semiconductors by low-energy ion bombardment (0.3-5 keV N 2+ or Ar+) using near-edge x-ray absorption fine structure (NEXAFS) around the N K-edge. Nitrogen interstitials and antisites have been identified in NEXAFS spectra of InN and GaN in full agreement with theoretical calculations. Several defect levels within the band gap and the conduction band of GaN and InN were clearly resolved in NEXAFS spectra. We attribute these levels to interstitial and antisite nitrogen in good agreement with theoretical calculations. Interstitial molecular nitrogen, N2, has been observed in all samples under consideration. The presence of N2 produces a sharp resonance in low-resolution NEXAFS spectra, showing the characteristic vibrational fine structure in high-resolution measurements.

    Original languageEnglish
    Title of host publicationProceedings of the 2008 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD'08
    Pages98-100
    Number of pages3
    DOIs
    Publication statusPublished - 2008
    Event2008 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD'08 - Sydney, NSW, Australia
    Duration: 28 Jul 20081 Aug 2008

    Publication series

    NameConference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD

    Conference

    Conference2008 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD'08
    Country/TerritoryAustralia
    CitySydney, NSW
    Period28/07/081/08/08

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