Characterisation of sputtering deposited amorphous silicon films for silicon heterojunction solar cells

Xinyu Zhang, Andres Cuevas, James Bullock

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    This work investigates intrinsic and doped amorphous silicon films deposited by RF sputtering. The correlation between surface passivation and the a-Si:H film properties are explored. It has been found that the passivation depends on both the incorporated hydrogen concentration and the bonding configuration. Furthermore, conductivity measurement are performed on the doped a-Si:H by sputtering for the first time. It has been confirmed that p and n-type doping can be achieved by using boron or phosphorus doped Si targets. However, further work on dopant activation is required to achieve the higher doping levels necessary for high efficiency devices.

    Original languageEnglish
    Title of host publication2016 IEEE 43rd Photovoltaic Specialists Conference, PVSC 2016
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages73-76
    Number of pages4
    ISBN (Electronic)9781509027248
    DOIs
    Publication statusPublished - 18 Nov 2016
    Event43rd IEEE Photovoltaic Specialists Conference, PVSC 2016 - Portland, United States
    Duration: 5 Jun 201610 Jun 2016

    Publication series

    NameConference Record of the IEEE Photovoltaic Specialists Conference
    Volume2016-November
    ISSN (Print)0160-8371

    Conference

    Conference43rd IEEE Photovoltaic Specialists Conference, PVSC 2016
    Country/TerritoryUnited States
    CityPortland
    Period5/06/1610/06/16

    Fingerprint

    Dive into the research topics of 'Characterisation of sputtering deposited amorphous silicon films for silicon heterojunction solar cells'. Together they form a unique fingerprint.

    Cite this