Characterization of defects created in Cz and epitaxial Si doped with Ga or B using Laplace-DLTS

Cloud Nyamhere*, P. N.K. Deenapanray, F. D. Auret, F. C. Farlow

*Corresponding author for this work

    Research output: Contribution to journalConference articlepeer-review

    4 Citations (Scopus)

    Abstract

    We have measured the electrical and annealing properties of defects created in epitaxial and Czochralski-grown Si doped with either B or Ga by electron irradiation using both conventional and Laplace deep level transient spectroscopy (L)-DLTS. With L-DLTS, we have been able to resolve several defects that cannot be resolved using conventional DLTS. L-DLTS provides a new avenue to study defect introduction rates and annealing kinetics in B- and Ga-doped Si. The isochronal annealing behaviour of the defects was also investigated.

    Original languageEnglish
    Pages (from-to)161-164
    Number of pages4
    JournalPhysica B: Condensed Matter
    Volume376-377
    Issue number1
    DOIs
    Publication statusPublished - 1 Apr 2006
    EventProceedings of the 23rd International Conference on Defects in Semiconductors -
    Duration: 24 Jul 200529 Jul 2005

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