Abstract
We have measured the electrical and annealing properties of defects created in epitaxial and Czochralski-grown Si doped with either B or Ga by electron irradiation using both conventional and Laplace deep level transient spectroscopy (L)-DLTS. With L-DLTS, we have been able to resolve several defects that cannot be resolved using conventional DLTS. L-DLTS provides a new avenue to study defect introduction rates and annealing kinetics in B- and Ga-doped Si. The isochronal annealing behaviour of the defects was also investigated.
| Original language | English |
|---|---|
| Pages (from-to) | 161-164 |
| Number of pages | 4 |
| Journal | Physica B: Condensed Matter |
| Volume | 376-377 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 1 Apr 2006 |
| Event | Proceedings of the 23rd International Conference on Defects in Semiconductors - Duration: 24 Jul 2005 → 29 Jul 2005 |