Characterization of palladium-related defects in silicon

R. Dogra*, A. P. Byrne, D. A. Brett, M. C. Ridgway

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    4 Citations (Scopus)

    Abstract

    Using 100Pd/100Rh probes, perturbed angular correlation measurements were performed to study Pd-related defects in Si as a function of dopant concentration and dopant type. Pd-vacancy and Pd-B complexes were identified by their characteristic electric field gradients in highly doped n- and p-type Si, respectively. Both pairs exhibited a T3/2 temperature dependence of their electric field gradients.

    Original languageEnglish
    Pages (from-to)33-37
    Number of pages5
    JournalHyperfine Interactions
    Volume177
    Issue number1-3
    DOIs
    Publication statusPublished - Jun 2007

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