@inproceedings{8b6afd611c304a6bbe9f332ad25e3ead,
title = "CMOS-compatible, plasma beam assisted reactive magnetron sputtered silicon nitride films for photonic integrated circuits",
abstract = "In this contribution, we demonstrate the deposition of low loss, CMOS-compatible SiN thin-films using plasma beam assisted reactive sputtering for photonic integrated circuits. Plasma beam assistance during the deposition process enabled us to achieve thin-film losses of below 0.1 dB/cm and a surface roughness of Rq of <0.1 nm, while keeping the processing temperatures below 400°C. Propagation losses of 0.9 dB/cm at 1550 nm have been achieved for waveguides with a cross section of 460× 2000 nm (height × width).",
keywords = "Propagation loss, Reactive sputtering, Silicon nitride, Silicon photonics, Waveguide",
author = "Andreas Frigg and Andreas Boes and Guanghui Ren and Choi, {Duk Yong} and Silvio Gees and Arnan Mitchell",
note = "Publisher Copyright: {\textcopyright} COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.; AOS Australian Conference on Optical Fibre Technology, ACOFT 2019 and Australian Conference on Optics, Lasers, and Spectroscopy, ACOLS 2019 ; Conference date: 09-12-2019 Through 12-12-2019",
year = "2019",
doi = "10.1117/12.2541269",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Arnan Mitchell and Halina Rubinsztein-Dunlop",
booktitle = "AOS Australian Conference on Optical Fibre Technology, ACOFT 2019 and Australian Conference on Optics, Lasers, and Spectroscopy, ACOLS 2019",
address = "United States",
}