Conical etched ion tracks in SiO2 characterised by small angle X-ray scattering

A. Hadley; C. Notthoff; P. Mota-Santiago; U. H. Hossain; S. Mudie; M. E. Toimil-Molares; C. Trautmann; P. Kluth

doi:10.1016/j.nimb.2017.10.020

Conical etched ion tracks in SiO₂ characterised by small angle X-ray scattering

A. Hadley^*, C. Notthoff, P. Mota-Santiago, U. H. Hossain, S. Mudie, M. E. Toimil-Molares, C. Trautmann, P. Kluth

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

We present a systematic study of the evolution of chemically etched ion tracks formed in thermally grown a-SiO₂ after irradiation with 1.1 GeV and 185 MeV Au ions. The irradiated material was subsequently etched with 2.5% hydrofluoric acid (HF) for different times yielding hollow conical shaped structures of various sizes. The characterisation of these structures was carried out by synchrotron-based small-angle X-ray scattering (SAXS) measurements, enabling the determination of the geometry and dimensions of the etched conical structures with sub-nanometre precision. The results indicate that the track etching behavior is influenced by the ion energy, and that at short etching times the latent track damage in the radial direction becomes significant.

Original language	English
Pages (from-to)	133-136
Number of pages	4
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	435
DOIs	https://doi.org/10.1016/j.nimb.2017.10.020
Publication status	Published - 15 Nov 2018

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Hadley, A., Notthoff, C., Mota-Santiago, P., Hossain, U. H., Mudie, S., Toimil-Molares, M. E., Trautmann, C., & Kluth, P. (2018). Conical etched ion tracks in SiO₂ characterised by small angle X-ray scattering. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 435, 133-136. https://doi.org/10.1016/j.nimb.2017.10.020

@article{c89e38eee9df45ffb9d37ed822427563,

title = "Conical etched ion tracks in SiO2 characterised by small angle X-ray scattering",

abstract = "We present a systematic study of the evolution of chemically etched ion tracks formed in thermally grown a-SiO2 after irradiation with 1.1 GeV and 185 MeV Au ions. The irradiated material was subsequently etched with 2.5% hydrofluoric acid (HF) for different times yielding hollow conical shaped structures of various sizes. The characterisation of these structures was carried out by synchrotron-based small-angle X-ray scattering (SAXS) measurements, enabling the determination of the geometry and dimensions of the etched conical structures with sub-nanometre precision. The results indicate that the track etching behavior is influenced by the ion energy, and that at short etching times the latent track damage in the radial direction becomes significant.",

keywords = "Etching, Ion track, Small angle X-ray scattering",

author = "A. Hadley and C. Notthoff and P. Mota-Santiago and Hossain, {U. H.} and S. Mudie and Toimil-Molares, {M. E.} and C. Trautmann and P. Kluth",

note = "Publisher Copyright: {\textcopyright} 2017 Elsevier B.V.",

year = "2018",

month = nov,

day = "15",

doi = "10.1016/j.nimb.2017.10.020",

language = "English",

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Hadley, A, Notthoff, C, Mota-Santiago, P, Hossain, UH, Mudie, S, Toimil-Molares, ME, Trautmann, C & Kluth, P 2018, 'Conical etched ion tracks in SiO₂ characterised by small angle X-ray scattering', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 435, pp. 133-136. https://doi.org/10.1016/j.nimb.2017.10.020

TY - JOUR

T1 - Conical etched ion tracks in SiO2 characterised by small angle X-ray scattering

AU - Hadley, A.

AU - Notthoff, C.

AU - Mota-Santiago, P.

AU - Hossain, U. H.

AU - Mudie, S.

AU - Toimil-Molares, M. E.

AU - Trautmann, C.

AU - Kluth, P.

PY - 2018/11/15

Y1 - 2018/11/15

N2 - We present a systematic study of the evolution of chemically etched ion tracks formed in thermally grown a-SiO2 after irradiation with 1.1 GeV and 185 MeV Au ions. The irradiated material was subsequently etched with 2.5% hydrofluoric acid (HF) for different times yielding hollow conical shaped structures of various sizes. The characterisation of these structures was carried out by synchrotron-based small-angle X-ray scattering (SAXS) measurements, enabling the determination of the geometry and dimensions of the etched conical structures with sub-nanometre precision. The results indicate that the track etching behavior is influenced by the ion energy, and that at short etching times the latent track damage in the radial direction becomes significant.

AB - We present a systematic study of the evolution of chemically etched ion tracks formed in thermally grown a-SiO2 after irradiation with 1.1 GeV and 185 MeV Au ions. The irradiated material was subsequently etched with 2.5% hydrofluoric acid (HF) for different times yielding hollow conical shaped structures of various sizes. The characterisation of these structures was carried out by synchrotron-based small-angle X-ray scattering (SAXS) measurements, enabling the determination of the geometry and dimensions of the etched conical structures with sub-nanometre precision. The results indicate that the track etching behavior is influenced by the ion energy, and that at short etching times the latent track damage in the radial direction becomes significant.

KW - Etching

KW - Ion track

KW - Small angle X-ray scattering

UR - http://www.scopus.com/inward/record.url?scp=85032975630&partnerID=8YFLogxK

U2 - 10.1016/j.nimb.2017.10.020

DO - 10.1016/j.nimb.2017.10.020

M3 - Article

SN - 0168-583X

VL - 435

SP - 133

EP - 136

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

ER -

Conical etched ion tracks in SiO₂ characterised by small angle X-ray scattering

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