Abstract
The contact resistivity of evaporated Al on doped silicon is examined for a range of process conditions common to the fabrication of laboratory silicon solar cells. The effects of silicon surface preparation prior to evaporation, sintering temperature, the use of a shutter, and evaporation power are investigated. The presented evaporation conditions yielded the lowest published contact resistivity between Al-and phosphorus-doped Si over a large range of doping concentration. It is also demonstrated that a contact resistivity below 10-6 Ω.cm 2 can be achieved without sintering. Three-dimensional simulations are utilized to compare the obtained results for evaporated Al contacts with those for passivated contacts.
| Original language | English |
|---|---|
| Article number | 7167674 |
| Pages (from-to) | 1304-1309 |
| Number of pages | 6 |
| Journal | IEEE Journal of Photovoltaics |
| Volume | 5 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 1 Sept 2015 |
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