Abstract
The development of low power micro-propulsion sources is of recent interest for application on miniature satellite platforms. Radio-frequency (rf) plasma electrothermal microthrusters can operate without a space-charge neutralizer and provide increased control of spatiotemporal power deposition. Further understanding of how the phase-resolved rf plasma heating mechanisms affect the phase-averaged bulk plasma properties, e.g. neutral gas temperature, could allow for in-flight tailoring of plasma thrusters. In this work, experimentally validated two-dimensional fluid-kinetic simulations were employed to study the spatially resolved electron and ion power deposition and neutral gas heating in a dual-frequency rf electrothermal microthruster operating at 1.5 Torr plenum pressure in argon. Experimental validation was performed through a comparison of the measured and simulated phase resolved Ar(2p1) excitation rates, showing close agreement. Two types of dual-frequency voltage waveforms were investigated, and comprise the combination of a 13.56 MHz voltage waveform with 27.12 MHz and 40.68 MHz waveforms, respectively. Varying the phase offset of the higher harmonic relative to the fundamental 13.56 MHz voltage waveform was found to modulate the dc self-bias voltage by 11% and 3% of the maximum applied peak-to-peak voltage, respectively. The 13.56 MHz, 27.12 MHz dual-frequency voltage waveform provided the highest degree of control, where the fraction of total rf power deposited into Ar+ ions was found to vary from 57% to 77%, modulating the on-axis neutral gas temperature by 35%. This control is attributed to the variation in the fraction of the rf phase cycle for which the sheath is collapsed, altering the phase-averaged electric field strength adjacent to the radial wall. The application of dual-frequency waveforms provides the ability to optimize the particle heating mechanisms with application to electrothermal propulsion.
Original language | English |
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Article number | 035019 |
Journal | Plasma Sources Science and Technology |
Volume | 28 |
Issue number | 3 |
DOIs | |
Publication status | Published - 25 Mar 2019 |