Controlled lateral growth of silica nanowire

Tae Hyun Kim, Avi Shalav, Robert G. Elliman

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    This study investigates the controlled lateral growth of amorphous silica nanowires using the Si active oxidation as the dominant SiO vapour precursor for nanowire growth. The development of complex multi-layered core shell nanowire structures using a combination of both active Si oxidation and secondary coating techniques is also demonstrated.

    Original languageEnglish
    Title of host publication2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 Proceedings
    Pages59-60
    Number of pages2
    DOIs
    Publication statusPublished - 2010
    Event2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 - Canberra, ACT, Australia
    Duration: 12 Dec 201015 Dec 2010

    Publication series

    NameConference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD

    Conference

    Conference2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010
    Country/TerritoryAustralia
    CityCanberra, ACT
    Period12/12/1015/12/10

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