Correlation of indentation-induced phase transformations with the degree of relaxation of ion-implanted amorphous silicon

Leonardus B. Bayu Aji*, S. Ruffell, B. Haberl, J. E. Bradby, J. S. Williams

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    4 Citations (Scopus)

    Abstract

    The probability for amorphous silicon (a-Si) to phase transform under indentation testing is statistically determined as a function of annealing temperature from the probability of a pop-out event occurring on the unloading curve. Raman microspectroscopy is used to confirm that the presence of a pop-out event during indentation is a clear signature that a-Si undergoes phase transformation. The probability for such a phase transformation increases with annealing temperature and reaches 100% at a temperature of 340 °C, a temperature well before the temperature where the average bond-angle distortion is fully minimized. This suggests that multiple processes are occurring during full relaxation.

    Original languageEnglish
    Pages (from-to)1056-1060
    Number of pages5
    JournalJournal of Materials Research
    Volume28
    Issue number8
    DOIs
    Publication statusPublished - 28 Apr 2013

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