Diffusion of ion implanted boron in preamorphized silicon
- K. S. Jones*
- , L. H. Zhang
- , V. Krishnamoorthy
- , M. Law
- , D. S. Simons
- , P. Chi
- , L. Rubin
- , R. G. Elliman
*Corresponding author for this work
Research output: Contribution to journal › Review article › peer-review
51
Citations
(Scopus)