Diffusion of ion implanted boron in preamorphized silicon

K. S. Jones*, L. H. Zhang, V. Krishnamoorthy, M. Law, D. S. Simons, P. Chi, L. Rubin, R. G. Elliman

*Corresponding author for this work

Research output: Contribution to journalReview articlepeer-review

49 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Diffusion of ion implanted boron in preamorphized silicon'. Together they form a unique fingerprint.

Engineering

Material Science

Earth and Planetary Sciences