Direct measurement of absorption-induced wavefront distortion in high optical power systems

Aidan F. Brooks, David Hosken, Jesper Munch, Peter J. Veitch, Zewu Yan, Chunnong Zhao, Yaohui Fan, Li Ju, David Blair, Phil Willems, Bram Slagmolen, Jerome Degallaix

    Research output: Contribution to journalArticlepeer-review

    18 Citations (Scopus)

    Abstract

    Wavefront distortion due to absorption in the substrates and coatings of mirrors in advanced gravitational wave interferometers has the potential to compromise the operation and sensitivity of these interferometers [Opt. Lett. 29, 2635-2637 (2004)]. We report the first direct spatially-resolved measurement, to our knowledge, of such wavefront distortion in a high optical power cavity. The measurement was made using an ultrahigh sensitivity Hartmann wavefront sensor on a dedicated test facility. The sensitivity of the sensor was A/730, where λ= 800 nm.

    Original languageEnglish
    Pages (from-to)355-364
    Number of pages10
    JournalApplied Optics
    Volume48
    Issue number2
    DOIs
    Publication statusPublished - 10 Jan 2009

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