Direct measurement of absorption-induced wavefront distortion in high optical power systems

Aidan F. Brooks; David Hosken; Jesper Munch; Peter J. Veitch; Zewu Yan; Chunnong Zhao; Yaohui Fan; Li Ju; David Blair; Phil Willems; Bram Slagmolen; Jerome Degallaix

doi:10.1364/AO.48.000355

Direct measurement of absorption-induced wavefront distortion in high optical power systems

Aidan F. Brooks, David Hosken, Jesper Munch, Peter J. Veitch, Zewu Yan, Chunnong Zhao, Yaohui Fan, Li Ju, David Blair, Phil Willems, Bram Slagmolen, Jerome Degallaix

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Abstract

Wavefront distortion due to absorption in the substrates and coatings of mirrors in advanced gravitational wave interferometers has the potential to compromise the operation and sensitivity of these interferometers [Opt. Lett. 29, 2635-2637 (2004)]. We report the first direct spatially-resolved measurement, to our knowledge, of such wavefront distortion in a high optical power cavity. The measurement was made using an ultrahigh sensitivity Hartmann wavefront sensor on a dedicated test facility. The sensitivity of the sensor was A/730, where λ= 800 nm.

Original language	English
Pages (from-to)	355-364
Number of pages	10
Journal	Applied Optics
Volume	48
Issue number	2
DOIs	https://doi.org/10.1364/AO.48.000355
Publication status	Published - 10 Jan 2009

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AU - Brooks, Aidan F.

AU - Hosken, David

AU - Munch, Jesper

AU - Veitch, Peter J.

AU - Yan, Zewu

AU - Zhao, Chunnong

AU - Fan, Yaohui

AU - Ju, Li

AU - Blair, David

AU - Willems, Phil

AU - Slagmolen, Bram

AU - Degallaix, Jerome

PY - 2009/1/10

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N2 - Wavefront distortion due to absorption in the substrates and coatings of mirrors in advanced gravitational wave interferometers has the potential to compromise the operation and sensitivity of these interferometers [Opt. Lett. 29, 2635-2637 (2004)]. We report the first direct spatially-resolved measurement, to our knowledge, of such wavefront distortion in a high optical power cavity. The measurement was made using an ultrahigh sensitivity Hartmann wavefront sensor on a dedicated test facility. The sensitivity of the sensor was A/730, where λ= 800 nm.

AB - Wavefront distortion due to absorption in the substrates and coatings of mirrors in advanced gravitational wave interferometers has the potential to compromise the operation and sensitivity of these interferometers [Opt. Lett. 29, 2635-2637 (2004)]. We report the first direct spatially-resolved measurement, to our knowledge, of such wavefront distortion in a high optical power cavity. The measurement was made using an ultrahigh sensitivity Hartmann wavefront sensor on a dedicated test facility. The sensitivity of the sensor was A/730, where λ= 800 nm.

UR - https://www.scopus.com/pages/publications/60949103368

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JO - Applied Optics

JF - Applied Optics

IS - 2

ER -

Direct measurement of absorption-induced wavefront distortion in high optical power systems

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