Disordering of Quantum Structures for Optoelectronic Device Integration

L. Fu*, S. Mokkapati, S. Barik, M. Buda, H. H. Tan, C. Jagadish

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

    1 Citation (Scopus)

    Abstract

    The development of future optical communication systems relies heavily on the fabrication of photonic integrated circuits (PICs) and optoelectronic integrated circuits (OEICs) with multiple functionalities, great reliability and robustness, simplified packaging, and reduced cost. Since the first demonstration in early the 1980s, postgrowth disordering of quantum-confined heterostructures such as quantum-wells (QWs) and quantum-dots (QDs) has been extensively researched worldwide as a simple, fl-xible, and low-cost approach for PICs/OEICs. In this chapter, we first review the main disordering techniques developed over last 20-30 years and their application in QW-based optoelectronic device integration. Then we present recent experimental results on disordering of both InGaAs/GaAs (on GaAs substrates) and InAs/InP (on InP substrates) QD materials and devices using the techniques of ion-implantation-induced disordering and impurity-free vacancy disordering.

    Original languageEnglish
    Title of host publicationComprehensive Semiconductor Science and Technology
    PublisherElsevier Inc.
    Pages584-625
    Number of pages42
    Volume1-6
    ISBN (Print)9780444531537
    DOIs
    Publication statusPublished - 1 Jan 2011

    Fingerprint

    Dive into the research topics of 'Disordering of Quantum Structures for Optoelectronic Device Integration'. Together they form a unique fingerprint.

    Cite this