Do palladium-dopant pairs exist in silicon?

R. Dogra*, D. A. Brett, A. P. Byrne, J. Mestnik-Filho, Y. Li, M. C. Ridgway

*Corresponding author for this work

    Research output: Contribution to journalConference articlepeer-review

    7 Citations (Scopus)

    Abstract

    The local structure and stability of an impurity complex of palladium in silicon has been studied on an atomic scale by perturbed angular correlation spectroscopy using the 100Pd/Rh probe nuclei. Palladium exists as an acceptor Pd- in n-type silicon and donor Pd+/2+ in p-type silicon. Owing to the Coulomb attraction between oppositely charged impurities, the probability of pair formation between palladium and dopants (P, As, Sb and B) seems to be quite favourable. In contrast, the impurity complex of the form PdSi-VSi has been identified in highly doped n-type silicon by its characteristic electric field gradient. The density function theory calculations of electric field gradient (EFG) for PdSi-VSi defect complex were consistent with the experimentally observed EFG.

    Original languageEnglish
    Pages (from-to)245-248
    Number of pages4
    JournalPhysica B: Condensed Matter
    Volume376-377
    Issue number1
    DOIs
    Publication statusPublished - 1 Apr 2006
    EventProceedings of the 23rd International Conference on Defects in Semiconductors -
    Duration: 24 Jul 200529 Jul 2005

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