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Effect of boron concentration on recombination at the p -Si-Al 2O3 interface

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    42 Citations (Scopus)

    Abstract

    We examine the surface passivation properties of Al2O 3 deposited on boron-doped planar âŸ̈100âŸ

    Original languageEnglish
    Article number093707
    JournalJournal of Applied Physics
    Volume115
    Issue number9
    DOIs
    Publication statusPublished - 7 Mar 2014

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