Effect of GaP strain compensation layers on rapid thermally annealed InGaAsGaAs quantum dot infrared photodetectors grown by metal-organic chemical-vapor deposition

L. Fu*, I. McKerracher, H. H. Tan, C. Jagadish, N. Vukmirović, P. Harrison

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    4 Citations (Scopus)

    Abstract

    The effect of GaP strain compensation layers was investigated on ten-layer InGaAsGaAs quantum dot infrared photodetectors (QDIPs) grown by metal-organic chemical-vapor deposition. Compared with the normal QDIP structure, the insertion of GaP has led to a narrowed spectral linewidth and slightly improved detector performance. A more significant influence of GaP was observed after the structure was annealed at various temperatures. While a similar amount of wavelength tuning was obtained, the GaP QDIPs exhibited much less degradation in device characteristics with increasing annealing temperature.

    Original languageEnglish
    Article number073515
    JournalApplied Physics Letters
    Volume91
    Issue number7
    DOIs
    Publication statusPublished - 2007

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