Abstract
Commercially prepared (100) oriented silicon wafers were oxidized to produce SiO2 layers of 5 μm, 970 nm, 650 nm and 103 nm. Each sample was annealed at 1050°C for 1 h in a forming gas ambient. The photoluminescence (PL) emission was collected with f4 optics consisting of two matched plano-convex lens of 50 mm diameter and 200 mm focal length, giving a collection angle of up to ±7°. The distortions were shown to be simple consequence of the wavelength dependent reflectivity of the sample structure.
Original language | English |
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Pages (from-to) | 4650-4652 |
Number of pages | 3 |
Journal | Journal of Applied Physics |
Volume | 96 |
Issue number | 8 |
DOIs | |
Publication status | Published - 15 Oct 2004 |