Effect of material structure on photoluminescence spectra from silicon nanocrystals

S. M. Orbons, M. G. Spooner, R. G. Elliman*

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    21 Citations (Scopus)

    Abstract

    Commercially prepared (100) oriented silicon wafers were oxidized to produce SiO2 layers of 5 μm, 970 nm, 650 nm and 103 nm. Each sample was annealed at 1050°C for 1 h in a forming gas ambient. The photoluminescence (PL) emission was collected with f4 optics consisting of two matched plano-convex lens of 50 mm diameter and 200 mm focal length, giving a collection angle of up to ±7°. The distortions were shown to be simple consequence of the wavelength dependent reflectivity of the sample structure.

    Original languageEnglish
    Pages (from-to)4650-4652
    Number of pages3
    JournalJournal of Applied Physics
    Volume96
    Issue number8
    DOIs
    Publication statusPublished - 15 Oct 2004

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