Effect of Microcavity Structures on the Photoluminescence of Silicon Nanocrystals

Marc G. Spooner*, Timothy M. Walsh, Robert G. Elliman

*Corresponding author for this work

    Research output: Contribution to journalConference articlepeer-review

    3 Citations (Scopus)

    Abstract

    Optical microcavity structures containing Si nanocrystals are fabricated by plasma enhanced chemical vapour deposition (PECVD) of SiO2 Si 3N4 and SiOx layers. The nanocrystals are formed within Si-rich oxide layers (SiOx) by precipitation and growth, and the microcavity structures defined by two parallel distributed Bragg mirrors (DBM) made from either alternate SiO2/Si 3N4 layers or alternate SiO2/SiOx layers. In the latter case, Si nanocrystal layers form part of the DBM structure thereby providing a distributed emission source. The optical emission from these and related structures are examined and compared with that from isolated nanocrystal layers.

    Original languageEnglish
    Pages (from-to)51-56
    Number of pages6
    JournalMaterials Research Society Symposium - Proceedings
    Volume770
    DOIs
    Publication statusPublished - 2003
    EventOptoelectronics of Group-IV-Based Materials - San Francisco, CA, United States
    Duration: 21 Apr 200324 Apr 2003

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