Abstract
Optical microcavity structures containing Si nanocrystals are fabricated by plasma enhanced chemical vapour deposition (PECVD) of SiO2 Si 3N4 and SiOx layers. The nanocrystals are formed within Si-rich oxide layers (SiOx) by precipitation and growth, and the microcavity structures defined by two parallel distributed Bragg mirrors (DBM) made from either alternate SiO2/Si 3N4 layers or alternate SiO2/SiOx layers. In the latter case, Si nanocrystal layers form part of the DBM structure thereby providing a distributed emission source. The optical emission from these and related structures are examined and compared with that from isolated nanocrystal layers.
Original language | English |
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Pages (from-to) | 51-56 |
Number of pages | 6 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 770 |
DOIs | |
Publication status | Published - 2003 |
Event | Optoelectronics of Group-IV-Based Materials - San Francisco, CA, United States Duration: 21 Apr 2003 → 24 Apr 2003 |