Effect of microstructure on dielectric breakdown in amorphous HfO2 films

S. K. Nandi; D. J. Llewellyn; K. Belay; D. K. Venkatachalam; X. Liu; R. G. Elliman

doi:10.1017/S1431927614011659

Effect of microstructure on dielectric breakdown in amorphous HfO₂ films

S. K. Nandi, D. J. Llewellyn, K. Belay, D. K. Venkatachalam, X. Liu, R. G. Elliman

Research output: Contribution to journal › Conference article › peer-review

3 Citations (Scopus)

Original language	English
Pages (from-to)	1984-1985
Number of pages	2
Journal	Microscopy and Microanalysis
Volume	20
Issue number	3
DOIs	https://doi.org/10.1017/S1431927614011659
Publication status	Published - 1 Aug 2014
Event	Microscopy and Microanalysis 2014, M and M 2014 - Hartford, United States Duration: 3 Aug 2014 → 7 Aug 2014

Access to Document

10.1017/S1431927614011659

Cite this

@article{9f51fc7df8fe412688de5ce48ac4ed6c,

title = "Effect of microstructure on dielectric breakdown in amorphous HfO2 films",

author = "Nandi, {S. K.} and Llewellyn, {D. J.} and K. Belay and Venkatachalam, {D. K.} and X. Liu and Elliman, {R. G.}",

year = "2014",

month = aug,

day = "1",

doi = "10.1017/S1431927614011659",

language = "English",

volume = "20",

pages = "1984--1985",

journal = "Microscopy and Microanalysis",

issn = "1431-9276",

publisher = "Oxford University Press ",

number = "3",

note = "Microscopy and Microanalysis 2014, M and M 2014 ; Conference date: 03-08-2014 Through 07-08-2014",

}

TY - JOUR

T1 - Effect of microstructure on dielectric breakdown in amorphous HfO2 films

AU - Nandi, S. K.

AU - Llewellyn, D. J.

AU - Belay, K.

AU - Venkatachalam, D. K.

AU - Liu, X.

AU - Elliman, R. G.

PY - 2014/8/1

Y1 - 2014/8/1

UR - http://www.scopus.com/inward/record.url?scp=84927948202&partnerID=8YFLogxK

U2 - 10.1017/S1431927614011659

DO - 10.1017/S1431927614011659

M3 - Conference article

SN - 1431-9276

VL - 20

SP - 1984

EP - 1985

JO - Microscopy and Microanalysis

JF - Microscopy and Microanalysis

IS - 3

T2 - Microscopy and Microanalysis 2014, M and M 2014

Y2 - 3 August 2014 through 7 August 2014

ER -

Effect of microstructure on dielectric breakdown in amorphous HfO2 films

Access to Document

Other files and links

Cite this

Effect of microstructure on dielectric breakdown in amorphous HfO₂ films