Effect of side wall roughness in buried channel waveguides

F. Ladouceur; J. D. Love; T. J. Senden

doi:10.1049/ip-opt:19941085

Effect of side wall roughness in buried channel waveguides

F. Ladouceur^*, J. D. Love, T. J. Senden

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

91 Citations (Scopus)

Abstract

An atomic force microscope is employed to measure the edge roughness of masks used in the fabrication of rectangular-core buried channel waveguides (BCWs) and to compare this with the corresponding roughness of the etched BCWs. Light attenuation due to scattering loss from the sides of the core can then be estimated using a simple statistical model to process the measured data.

Original language	English
Pages (from-to)	242-248
Number of pages	7
Journal	IEE Proceedings: Optoelectronics
Volume	141
Issue number	4
DOIs	https://doi.org/10.1049/ip-opt:19941085
Publication status	Published - Aug 1994
Externally published	Yes

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title = "Effect of side wall roughness in buried channel waveguides",

abstract = "An atomic force microscope is employed to measure the edge roughness of masks used in the fabrication of rectangular-core buried channel waveguides (BCWs) and to compare this with the corresponding roughness of the etched BCWs. Light attenuation due to scattering loss from the sides of the core can then be estimated using a simple statistical model to process the measured data.",

author = "F. Ladouceur and Love, {J. D.} and Senden, {T. J.}",

year = "1994",

month = aug,

doi = "10.1049/ip-opt:19941085",

language = "English",

volume = "141",

pages = "242--248",

journal = "IEE Proceedings: Optoelectronics",

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T1 - Effect of side wall roughness in buried channel waveguides

AU - Ladouceur, F.

AU - Love, J. D.

AU - Senden, T. J.

PY - 1994/8

Y1 - 1994/8

N2 - An atomic force microscope is employed to measure the edge roughness of masks used in the fabrication of rectangular-core buried channel waveguides (BCWs) and to compare this with the corresponding roughness of the etched BCWs. Light attenuation due to scattering loss from the sides of the core can then be estimated using a simple statistical model to process the measured data.

AB - An atomic force microscope is employed to measure the edge roughness of masks used in the fabrication of rectangular-core buried channel waveguides (BCWs) and to compare this with the corresponding roughness of the etched BCWs. Light attenuation due to scattering loss from the sides of the core can then be estimated using a simple statistical model to process the measured data.

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U2 - 10.1049/ip-opt:19941085

DO - 10.1049/ip-opt:19941085

M3 - Article

AN - SCOPUS:0028482287

SN - 1350-2433

VL - 141

SP - 242

EP - 248

JO - IEE Proceedings: Optoelectronics

JF - IEE Proceedings: Optoelectronics

IS - 4

ER -

Effect of side wall roughness in buried channel waveguides

Abstract

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