Effects of cross field diffusion in a low pressure high density oxygen/silane plasma

C. Charles

doi:10.1116/1.1481042

Effects of cross field diffusion in a low pressure high density oxygen/silane plasma

C. Charles^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

Wall charging was measured for a low pressure high density oxygen/silane plasma of various flow-rate ratios (R=1-10). It was found that the degree of electronegativity of the discharge close to the wall is the main varying parameter when changing R. A major transition in the physicochemistry of the discharge was observed for R=2. For R=<2, polymerization was observed in the positive ion spectrum which is accompanied by a depletion in the O⁺ and O^- ions.

Original language	English
Pages (from-to)	1275-1283
Number of pages	9
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	20
Issue number	4
DOIs	https://doi.org/10.1116/1.1481042
Publication status	Published - Jul 2002

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abstract = "Wall charging was measured for a low pressure high density oxygen/silane plasma of various flow-rate ratios (R=1-10). It was found that the degree of electronegativity of the discharge close to the wall is the main varying parameter when changing R. A major transition in the physicochemistry of the discharge was observed for R=2. For R=<2, polymerization was observed in the positive ion spectrum which is accompanied by a depletion in the O+ and O- ions.",

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AB - Wall charging was measured for a low pressure high density oxygen/silane plasma of various flow-rate ratios (R=1-10). It was found that the degree of electronegativity of the discharge close to the wall is the main varying parameter when changing R. A major transition in the physicochemistry of the discharge was observed for R=2. For R=<2, polymerization was observed in the positive ion spectrum which is accompanied by a depletion in the O+ and O- ions.

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U2 - 10.1116/1.1481042

DO - 10.1116/1.1481042

M3 - Article

SN - 0734-2101

VL - 20

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JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 4

ER -

Effects of cross field diffusion in a low pressure high density oxygen/silane plasma

Abstract

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