Effects of lnxGa1-xAs matrix layer on in As quantum dot formation and their emission wavelength

Zongyou Yin, Xiaohong Tang*, Wei Liu, Daohua Zhang, Anyan Du

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)

Abstract

Self-assembled InAs quantum dots (QDs) grown on different In xGa1-xAs/InP matrixes by metal-organic chemical vapor deposition with fast nucleation rate and atomic layer epitaxy in pure nitrogen ambient have been studied. It has been found that the InAs QD formation efficiency is enhanced when the dots are grown on the strained In xGa1-xAs/InP matrix compared with the dots grown on an unstrained InxGa1-xAs/InP matrix. By changing the indium composition x of the InxGa1-xAs barrier from 0.53 to 0.72, the 77 K photoluminescence (PL) emission wavelength of the InAs QD structures is redshifted by 220-300 nm. The transition energy of the InAs/InGaAs/InP QD structure has been calculated by using the eight-band k·p theory with consideration of the strain effect from QD's upper InxGa 1-xAs barrier layer. The calculated E1-HH1 transition energies agree with the measured PL emission peaks quite well.

Original languageEnglish
Article number033109
JournalJournal of Applied Physics
Volume100
Issue number3
DOIs
Publication statusPublished - 2006
Externally publishedYes

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