Electrochemical deposition of Cl-doped n-type Cu₂O on reduced graphene oxide electrodes

Reduced graphene oxide (rGO) electrodes can be applied for the electrochemical deposition of various semiconductor oxides. In this study, we demonstrate the electrochemical deposition of Cl-doped n-type Cu₂O (Cl-Cu₂O) on rGO electrodes. The structure and properties of the deposited Cl-Cu₂O have been investigated extensively. Moreover, the effect of Cl doping on the carrier concentration and photocurrent of Cl-Cu ₂O has also been investigated. Our study shows significant implications in tailoring the properties of materials deposited on rGO electrodes by using electrochemical methods.