Abstract
Procedures are described for electrodeposition of bright, well-adhered elemental target layers of platinum and osmium ∼1-∼2 mg cm-2 thick on substrates of Fe, Co, Cu, and Ag.
| Original language | English |
|---|---|
| Pages (from-to) | 293-295 |
| Number of pages | 3 |
| Journal | Nuclear Instruments and Methods In Physics Research |
| Volume | 211 |
| Issue number | 2-3 |
| DOIs | |
| Publication status | Published - 15 Jun 1983 |
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