Electron flux controlled switching between electron beam induced etching and deposition

M. Toth^*, W. R. Knowles, G. Hartigan, C. J. Lobo

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	168-169
Number of pages	2
Journal	Microscopy and Microanalysis
Volume	12
Issue number	SUPPL. 2
DOIs	https://doi.org/10.1017/S1431927606069753
Publication status	Published - Aug 2006

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title = "Electron flux controlled switching between electron beam induced etching and deposition",

author = "M. Toth and Knowles, {W. R.} and G. Hartigan and Lobo, {C. J.}",

year = "2006",

month = aug,

doi = "10.1017/S1431927606069753",

language = "English",

volume = "12",

pages = "168--169",

journal = "Microscopy and Microanalysis",

issn = "1431-9276",

publisher = "Oxford University Press ",

number = "SUPPL. 2",

}

TY - JOUR

T1 - Electron flux controlled switching between electron beam induced etching and deposition

AU - Toth, M.

AU - Knowles, W. R.

AU - Hartigan, G.

AU - Lobo, C. J.

PY - 2006/8

Y1 - 2006/8

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U2 - 10.1017/S1431927606069753

DO - 10.1017/S1431927606069753

M3 - Article

SN - 1431-9276

VL - 12

SP - 168

EP - 169

JO - Microscopy and Microanalysis

JF - Microscopy and Microanalysis

IS - SUPPL. 2

ER -