Electronic Structure Shift of Deeply Nanoscale Silicon by Si O2 versus Si3 N4 Embedding as an Alternative to Impurity Doping

Dirk König, Noël Wilck, Daniel Hiller, Birger Berghoff, Alexander Meledin, Giovanni Di Santo, Luca Petaccia, Joachim Mayer, Sean Smith, Joachim Knoch

    Research output: Contribution to journal › Article › peer-review

    8 Citations (Scopus)

    Fingerprint

    Dive into the research topics of 'Electronic Structure Shift of Deeply Nanoscale Silicon by Si O2 versus Si3 N4 Embedding as an Alternative to Impurity Doping'. Together they form a unique fingerprint.

    Material Science