Electronic Structure Shift of Deeply Nanoscale Silicon by Si O2 versus Si3 N4 Embedding as an Alternative to Impurity Doping

Dirk König, Noel Wilck, Daniel Hiller, Birger Berghoff, Alexander Meledin, Giovanni Di Santo, Luca Petaccia, Joachim Mayer, Sean Smith, Joachim Knoch

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

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