TY - JOUR
T1 - Engineering Quantum Light Sources with Flat Optics
AU - Ma, Jinyong
AU - Zhang, Jihua
AU - Horder, Jake
AU - Sukhorukov, Andrey A.
AU - Toth, Milos
AU - Neshev, Dragomir N.
AU - Aharonovich, Igor
N1 - Publisher Copyright:
© 2024 The Authors. Advanced Materials published by Wiley-VCH GmbH.
PY - 2024/6/6
Y1 - 2024/6/6
N2 - Quantum light sources are essential building blocks for many quantum technologies, enabling secure communication, powerful computing, and precise sensing and imaging. Recent advancements have witnessed a significant shift toward the utilization of "flat" optics with thickness at subwavelength scales for the development of quantum light sources. This approach offers notable advantages over conventional bulky counterparts, including compactness, scalability, and improved efficiency, along with added functionalities. This review focuses on the recent advances in leveraging flat optics to generate quantum light sources. Specifically, the generation of entangled photon pairs through spontaneous parametric down-conversion in nonlinear metasurfaces, and single photon emission from quantum emitters including quantum dots and color centers in 3D and 2D materials are explored. The review covers theoretical principles, fabrication techniques, and properties of these sources, with particular emphasis on the enhanced generation and engineering of quantum light sources using optical resonances supported by nanostructures. The diverse application range of these sources is discussed and the current challenges and perspectives in the field are highlighted.This review explores latest development of leveraging flat-optics to generate ultra-compact quantum light sources with improved efficiency and added functionalities. It highlights photon-pair sources with nonlinear metasurfaces and single-photon emitters in 3D and 2D materials integrated with metasurfaces. The review also discusses current challenges and provide insights into the potential future directions for advancing flat-optics quantum light sources. image
AB - Quantum light sources are essential building blocks for many quantum technologies, enabling secure communication, powerful computing, and precise sensing and imaging. Recent advancements have witnessed a significant shift toward the utilization of "flat" optics with thickness at subwavelength scales for the development of quantum light sources. This approach offers notable advantages over conventional bulky counterparts, including compactness, scalability, and improved efficiency, along with added functionalities. This review focuses on the recent advances in leveraging flat optics to generate quantum light sources. Specifically, the generation of entangled photon pairs through spontaneous parametric down-conversion in nonlinear metasurfaces, and single photon emission from quantum emitters including quantum dots and color centers in 3D and 2D materials are explored. The review covers theoretical principles, fabrication techniques, and properties of these sources, with particular emphasis on the enhanced generation and engineering of quantum light sources using optical resonances supported by nanostructures. The diverse application range of these sources is discussed and the current challenges and perspectives in the field are highlighted.This review explores latest development of leveraging flat-optics to generate ultra-compact quantum light sources with improved efficiency and added functionalities. It highlights photon-pair sources with nonlinear metasurfaces and single-photon emitters in 3D and 2D materials integrated with metasurfaces. The review also discusses current challenges and provide insights into the potential future directions for advancing flat-optics quantum light sources. image
KW - flat optics
KW - metasurface
KW - photon pairs
KW - quantum light source
KW - single photon source
UR - http://www.scopus.com/inward/record.url?scp=85190560428&partnerID=8YFLogxK
U2 - 10.1002/adma.202313589
DO - 10.1002/adma.202313589
M3 - Review article
SN - 0935-9648
VL - 36
JO - Advanced Materials
JF - Advanced Materials
IS - 23
M1 - 2313589
ER -